基本信息
出版地:UNITED STATES
期刊简称:IEEE T PLASMA SCI
通讯地址:IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, USA, NJ, 08855-4141
创刊年份:1973
发行周期:Bimonthly
涉及方向:物理 - 物理：流体与等离子体
ESSN:1939-9375
英文期刊简介
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
中文期刊简介
《Ieee Transactions On Plasma Science》是一本由IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC出版商出版的专业物理期刊，该刊创刊于1973年，刊期Bimonthly，该刊已被国际权威数据库SCI、SCIE收录。在中科院最新升级版分区表中，该刊分区信息为大类学科：物理 4区，小类学科：物理：流体与等离子体 4区；在JCR（Journal Citation Reports）分区等级为Q4。该刊发文范围涵盖物理：流体与等离子体等领域，旨在及时、准确、全面地报道国内外物理：流体与等离子体工作者在该领域取得的最新研究成果、工作进展及学术动态、技术革新等，促进学术交流，鼓励学术创新。2021年影响因子为1.368，平均审稿速度约3.7个月。
