基本信息
出版地:UNITED STATES
期刊简称:J LASER APPL
通讯地址:LASER INST AMER, 13501 INGENUITY DR, SUITE 128, ORLANDO, USA, FL, 32826
创刊年份:1988
发行周期:Quarterly
涉及方向:物理 - 光学
ESSN:1938-1387
英文期刊简介
The Journal of Laser Applications (JLA) is the scientific platform of the Laser Institute of America (LIA) and is published in cooperation with AIP Publishing. The high-quality articles cover a broad range from fundamental and applied research and development to industrial applications. Therefore, JLA is a reflection of the state-of-R&D in photonic production, sensing and measurement as well as Laser safety.
The following international and well known first-class scientists serve as allocated Editors in 9 new categories:
High Precision Materials Processing with Ultrafast Lasers
Laser Additive Manufacturing
High Power Materials Processing with High Brightness Lasers
Emerging Applications of Laser Technologies in High-performance/Multi-function Materials and Structures
Surface Modification
Lasers in Nanomanufacturing / Nanophotonics & Thin Film Technology
Spectroscopy / Imaging / Diagnostics / Measurements
Laser Systems and Markets
Medical Applications & Safety
Thermal Transportation
Nanomaterials and Nanoprocessing
Laser applications in Microelectronics.
中文期刊简介
《Journal Of Laser Applications》是一本由AMER INST PHYSICS出版商出版的专业工程技术期刊，该刊创刊于1988年，刊期Quarterly，该刊已被国际权威数据库SCIE收录。在中科院最新升级版分区表中，该刊分区信息为大类学科：工程技术 4区，小类学科：材料科学：综合 4区；光学 4区；物理：应用 4区；在JCR（Journal Citation Reports）分区等级为Q3。该刊发文范围涵盖材料科学：综合等领域，旨在及时、准确、全面地报道国内外材料科学：综合工作者在该领域取得的最新研究成果、工作进展及学术动态、技术革新等，促进学术交流，鼓励学术创新。2021年影响因子为2.521，平均审稿速度>12周，或约稿。
